GHGRP 2014: Electronics Manufacturing
This source category includes, but is not limited to, facilities that manufacture semiconductors (including light-emitting diodes), micro-electromechanical systems (MEMS), liquid crystal displays (LCDs), and photovoltaic cells (PV). Specifically, this subsector consists of electronics manufacturing facilities with production processes that use plasma-generated fluorine atoms and other reactive fluorine-containing fragments to etch thin films, clean chambers for depositing thin films, clean wafers, or remove residual material. The source category also includes electronics manufacturing facilities with chemical vapor deposition processes or other production processes that use N2O, and with processes that use fluorinated GHGs as heat transfer fluids (HTF) to control temperature or clean surfaces.
- Location and emissions range for each reporting facility in the Electronics Manufacturing sector (as of 8/16/15).
This map shows the locations of direct-emitting facilities. The size of a circle corresponds to the quantity of emissions reported by that facility.
|Electronics Manufacturing — Greenhouse Gas Emissions Reported to the GHGRP
(all emissions values presented in million metric tons CO2e)
|Number of facilities:||53||53||53||52|
|Total emissions (CO2e):||6.8||6.5||5.0||5.7|
|Emissions by greenhouse gas (CO2e)
|• Carbon dioxide (CO2):||1.6||1.5||0.7||0.7|
|• Methane (CH4):||**||**||**||**|
|• Nitrous oxide (N2O):||0.2||0.2||0.2||0.2|
|• Hydrofluorocarbons (HFCs):||0.2||0.2||0.2||0.3|
|• Hydrofluoroethers (HFEs):||**||**||**||**|
|• Perfluorocarbons (PFCs):||3.8||3.6||3.1||2.7|
|• Sulfur hexafluoride (SF6):||0.3||0.3||0.3||0.7|
|• Nitrogen trifluoride (NF3):||0.6||0.6||0.5||0.4|
- Emissions of CO2 and CH4 are from stationary fuel combustion sources.